au.\*:("HOJYO, Yutaka")
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Enhancement of unified mask data formats for EB writersSUZUKI, Toshio; HIRUMI, Junji; YOSHIOKA, Nobuyuki et al.SPIE proceedings series. 2004, pp 1186-1194, isbn 0-8194-5513-X, 2Vol, 9 p.Conference Paper
The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-Contours from wafer and maskHIBINO, Daisuke; SHINDO, Hiroyuki; HOJYO, Yutaka et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81661S.1-81661S.9, 2Conference Paper
The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-Contours from wafer and maskHIBINO, Daisuke; HOJYO, Yutaka; SHINDO, Hiroyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7971, issn 0277-786X, isbn 978-0-8194-8530-4, 79712G.1-79712G.9, 2Conference Paper
High-precision contouring from SEM image in 32-nm lithography and beyondSHINDO, Hiroyuki; SUGIYAMA, Akiyuki; VAN DE KERKHOVE, Jeroen et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7275, issn 0277-786X, isbn 978-0-8194-7528-2 0-8194-7528-9, 1Vol, 72751F.1-72751F.9Conference Paper
The unified mask data format based on OASIS for VSB EB writersSUZUKI, Toshio; HIRUMI, Junji; HOJYO, Yutaka et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-5853-8, 2Vol, Part , 152-159Conference Paper